List of Publications by Prof. Dr. Ulf Kleineberg
Publications from 2006 and newer are listed on the publications page.
Publications by year: 2005, 2004, 2003, 2002, 2001, 2000, 1999, 1998, 1997, 1996, 1995, 1994, 1993, 1992, 1991, 1990
Publications by year: 2005, 2004, 2003, 2002, 2001, 2000, 1999, 1998, 1997, 1996, 1995, 1994, 1993, 1992, 1991, 1990
Publications in 2005
Toward time-resolved soft x-ray microscopy using pulsed fs-high-harmonic radiation
M. Wieland, Ch. Spielmann, U. Kleineberg, Th. Westerwalbesloh, U. Heinzmann, T. Wilhein, Ultramicroscopy 102 (2), 93-100 (2005) [article]
Attosecond metrology with controlled light waveforms
M. Uiberacker, E. Goulielmakis, R. Kienberger, A. Baltuška, T. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, and F. Krausz, Laser Physics 15, 195-204 (2005) [article]
Publications in 2004
Multilayer EUV Optics for Applications of Ultrashort High Harmonic Pulses
Th. Westerwalbesloh, U. Kleineberg, Y. C. Lim, P. Siffalovic, M. Drescher, U. Heinzmann, in "Ultrafast Optics IV" eds. F. Krausz et. al. Springer, Series in Opt. Scien. Vol 95, pp 229-234 (2004) [article]
Time-resolved inner shell spectroscopy with sub-fs EUV pulses
M. Drescher, M. Hentschel, R. Kienberger, M. Uiberacker, V. Yakovlev, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, F. Krausz, in "Ultrafast Optics IV" eds. F. Krausz et. al. Springer, Series in Opt. Scien. Vol 95, pp 475-481 (2004) [article]
Application of high-harmonic radiation for EUV interferometry and spectroscopy
M. Wieland, Ch. Spielmann, U. Kleineberg, U. Heinzmann, T. Wilhein, in "Ultrafast Optics IV" eds. F. Krausz et. al. Springer, Series in Opt. Scien. Vol 95, pp 467-474 (2004) [article]
Reproducible generation and measurement of isolated sub-fs XUV pulses with phase-controlled few-cycle light
R. Kienberger, E. Goulielmakis, A. Baltuska, M. Uiberacker, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz, in "Ultrafast Optics IV" eds. F. Krausz et. al. Springer, Series in Opt. Scien. Vol 95, pp 241-246 (2004) [article]
Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy
A. Wonisch, Th. Westerwalbesloh, W. Hachmann, N. Kabachnik, U. Kleineberg, U. Heinzmann, Thin Solid Films 464-465, pp 473-477 (2004) [article]
Characterization and tests of planar Co3O4 model catalysts prepared by chemical vapour deposition
N. Bahlawane, E. F. Rivera, K. Kohse-Höinghaus, A. Brechling, U. Kleineberg, Applied Catalysis B – Environmental 53 (4), 245-255 (2004) [article]
Time-resolved electron spectroscopy of atomic inner shell dynamics
M. Drescher, M. Hentschel, R. Kienberger, M. Uiberacker, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, F. Krausz, Journal of Electron Spectroscopy and Related Phenomena 137-140, pp 259-264 (2004) [article]
Direct Measurement of Light Waves
E. Goulielmakis, M. Uiberacker, R. Kienberger, A. Baltuska, V. Yakovlev, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz, Science 305 (5688), pp. 1267-1269 (2004) [article]
Atomic transient recorder
R. Kienberger, E. Goulielmakis, M. Uiberacker, A. Baltuska, V. Yakovlev, F. Bammer, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz, Nature 427, 817-821 (2004) [article]
Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy
A. Wonisch, Th. Westerwalbesloh, W. Hachmann, N. Kabachnik, U. Kleineberg, U. Heinzmann, Thin Solid Films 464-465, pp 473-477 (2004) [article]
Structural organization of DMPC lipid layers on chemically micropatterned self-assembled monolayers as biomimetic systems
A. Brechling, M. Pohl, U. Kleineberg, U. Heinzmann, Journal of Biotechnoogy 112 (1-2), 115-125 (2004) [article]
Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
L. Dreeskornfeld, G. Haindl, U. Kleineberg, U. Heinzmann, F. Shi, B. Volland, I.W. Rangelow, E. Majkova, S. Luby, I. Kostic, L. Matay, P. Hrkut, P. Hudek, H.-Y. Lee, Thin Solid Films 458 (1-2), 227-232 (2004) [article]
Transmission Photoelectron Microscopy Of Diatoms At The Multilayer Monochromator Beamline U125-1/ML At BESSY II
M. Pohl, U. Kleineberg, U. Heinzmann, AIP Conferenc Proceedings 705, 1360-1363 (2004) [article]
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Publications in 2003
Zone plate interferometry at 13 nm wavelength
M. Wieland, T. Wilhein, C. Spielmann, U. Kleineberg, Appl. Phys. B Laser and Optics 76 (8), 885-889 (2003) [article]
Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing
U. Kleineberg, Th. Westerwalbesloh, W. Hachmann, U. Heinzmann, J.Tümmler, F. Scholze, G. Ulm, S. Müllender, Thin Solid Films 433 (1-2), 230-236 (2003) [article]
Characterization of DMPC bilayers and multilamellar islands on hydrophobic self-assembled monolayers of ODS/Si(100) and mixed ODS-DDS/Si (100)
A. Brechling, M. Sundermann, U. Kleineberg, U. Heinzmann, Thin Solid Films 433 (1-2), 281-286 (2003) [article]
Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction
A. Aschentrup, W. Hachmann, T. Westerwalbesloh, Y.C. Lim, U. Kleineberg, U. Heinzmann, Appl. Phys. A 77 (5), pp 607-611 (2003) [article]
Submicron imaging in the EUV spectral range using high-harmonic radiation
M. Wieland, R. Früke, T. Wilhein, U. Kleineberg, M. Pohl, Ch. Spielmann, F. Krausz, Journal de Physique IV (Proceedings), 104, 149-152 (2003) [article]
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Publications in 2002
Time-resolved atomic inner-shell spectroscopy
M. Drescher, M. Hentschel, R. Kienberger, M. Uiberacker, V. Yakovlev, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, F. Krausz, Nature 419, 803-807 (2002) [article]
Steering Attosecond Electron Wave Packets with Light
R. Kienberger, M. Hentschel, M. Uiberacker, Ch. Spielmann, M. Kitzler, A. Scrinzi, M. Wieland, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz, Science 297 (5584), 1144-1148 (2002) [article]
Submicron extreme ultraviolet imaging using high-harmonic radiation
M. Wieland, R. Frueke, T. Wilhein, Ch. Spielmann, M. Pohl, U. Kleineberg, Applied Physics Letters 81, 2520 (2002) [article]
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Publications in 2001
Bufferlayer and caplayer engineering of Mo/Si EUVL multilayer mirrors
U. Kleineberg, Th. Westerwalbesloh, O. Wehmeyer, M. Sundermann, A. Brechling, U. Heinzmann, M. Haidl, S. Müllender, Proceedings SPIE 4506, 113-120 (2001) [article]
Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD
F. Hamelmann, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar, P. Jutzi, Journale de Physique IV 11 (3), 431-436 (2001) [article]
Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers-X-ray comparative study
A. Anopchenko, M. Jergel, E. Majková, S. Luby, V. Holý, A. Aschentrup, I. Kolina, Y.-C. Lim, G. Haindl, U. Kleineberg, U. Heinzmann, Physica B 305 (1), 14-20 (2001) [article]
Giant magnetoresistance of hysteresis-free Cu/Co-based multilayers
A. Hütten, T. Hempel, W. Schepper, U. Kleineberg, G. Reiss, Journal of Magnetism and Magnetic Materials 226-230 (2), 1758-1760 (2001) [article]
Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
Y.C. Lim, T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl, U. Kleineberg, U. Heinzmann, Applied Physics A 72 (1), 121-124 (2001) [article]
Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy
U. Kleineberg, G. Haindl, A. Hütten, G. Reiss, E.M. Gullikson, M.S. Jones, S. Mrowka, S.B. Rekawa, J.H. Underwood, D.T. Attwood, Applied Physics A 73 (4), 515-519 (2001) [article]
STM lithography in organic Self-Assembled Monolayer
U. Kleineberg, A. Brechling, M. Sundermann, U. Heinzmann, Advanced Functional Materials 11(3), 208-212 (2001) [article]
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Publications in 2000
Effect of ion-beam polishing on the interface quality in a Ti/C multilayer mirror for 'water window'
M. Jergel, V. Holý, E. Majková, S. Luby, R. Senderák, H.J. Stock, D. Menke, U. Kleineberg, U. Heinzmann, Materials Science Forum 321-324, 184-191 (2000) [article]
Metal oxide/silicon oxide multilayers with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358(1-2), 90-93 (2000) [article]
Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films
A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6(2), 63-66 (2000) [article]
Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in self-assembled monolayers
M. Sundermann, J. Hartwich, K. Rott, D. Meyners, E. Majkova, U. Kleineberg, M. Grunze, U. Heinzmann, Surf. Science 454-456, 1104-1109 (2000) [article]
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
L. Dreeskornfeld, R. Segler, G. Haindl, O. Wehmeyer, S. Rahn, E. Majkova, U. Kleineberg, U. Heinzmann, P. Hudek, I. Kostic, Microelectronic Engineering 54(3-4), 303-314 (2000) [article]
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Publications in 1999
Metal/Silicon Multilayers Produced by Low-Temperature MOCVD
F. Hamelmann, G. Haindl, A. Klipp, E. Majkova, U. Kleineberg, P. Jutzi, U, Heinzmann, Properties and Processing of Vapor-Deposited Coatings (eds. M. Pickering, B.W. Sheldon, W.Y. Lee, R.N. Johnson), Mater. Res. Soc. Proc. 555, 19-24 (1999) [article]
In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors
F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S. H. A. Petri, P. Jutzi, in N. Auner, J. Weis (Eds.), Organosilicon Chemistry Set: From Molecules to Materials IV, VCH Weinheim (Germany), 798 (1999) [article]
Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
M. Wedowski, S. Bajt, J. A. Folta, E.M. Gullikson, U. Kleineberg, L.E. Klebanoff, M.E. Malinowski, W.M. Clift, Proceedings SPIE 3767, 217-224 (1999) [article]
Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing
S. Luby, M. Jergel, A. Anopchenko, A. Aschentrup, F. Hamelmann, E. Majkova, U. Kleineberg, U. Heinzmann, Applied Surface Science 150(1-4), 178-184 (1999) [article]
Comparison of Mechanically Ruled Versus Holographically Varied Line-Spacing Grating for a Soft-X-Ray Flat-Field Spectrograph
T. Yamazaki, E. Gullikson, N. Miyata, M. Koike, Y. Harada, S. Mrowka, U. Kleineberg, J. H. Underwood, M. M. Yanagihara, K. Sano, Applied Optics 38(19), pp. 4001-4003 (1999) [article]
Application of Reactive Ion Etching to the Fabrication of Microstructure on Mo/Si Multilayer
Le Zi-chun, L. Dreeskornfeld, S. Rahn, R. Segler, U. Kleineberg, U. Heinzmann, Chinese Physics Letters 16(9), pp. 665-666 (1999) [article]
Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY
U. Kleineberg, D. Menke, F. Hamelmann, U. Heinzmann, O. Schmidt, G.H. Fecher, G. Schönhense, Journal of Electron Spectroscopy and Related Phenomena 101-103, pp. 931-936 (1999) [article]
W/Si multilayers deposited by hot-filament MOCVD
F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld, U. Kleineberg, P. Jutzi, U. Heinzmann, Thin Solid Films 338(1-2), pp 70-74 (1999) [article]
STM writing of artificial nanostructures in alkanethiol-type self-assembled monolayers
J. Hartwich, M. Sundermann, U. Kleineberg, U. Heinzmann, Appl. Surf. Sci 144-145, 538-542 (1999) [article]
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Publications in 1998
Time-of-flight photoelectron emission microscopy TOF-PEEM : First results
H. Spiecker, O. Schmidt, Ch. Ziethen, D. Menke, U. Kleineberg, R.C. Ahuja, M. Merkel, U. Heinzmann, G. Schönhense, Nucl. Instrum. Meth. A 406(3), pp. 499-506 (1998) [article]
STM writing of artificial nanostructures in ultrathin PMMA and SAM resists and subsequent pattern transfer in a Mo/Si multilayer by reactive ion etching
J. Hartwich, L. Dreeskornfeld, V. Heisig, S. Rahn, O. Wehmeyer, U. Kleineberg, U. Heinzmann, Applied Physics A 66(1), pp. 685-688 (1998) [article]
Chemical microanalysis by selected-area ESCA using an electron energy filter in a photoemission microscope
O. Schmidt, Ch. Ziethen, G.H. Fecher, M. Merkel, M. Escher, D. Menke, U. Kleineberg, U. Heinzmann, G. Schönhense, Journal of Electron Spectroscopy and Related Phenomena 88-91, pp. 1009-1014 (1998) [article]
X-ray scattering study of interface roughness correlation in Mo/Si and Ti/C multilayers for X-UV optics
M. Jergel, V. Holý, E. Majková, S. Luby, R. Senderák, H.-J. Stock, D. Menke, U. Kleineberg, U. Heinzmann, Physica B 253(1-2), pp. 28-39 (1998) [article]
Carbon/Titanium multilayer as soft x-ray mirrors for the water-window
H.-J. Stock, G. Haindl, F. Hamelmann, D. Menke, O. Wehmeyer, U. Kleineberg, U. Heinzmann, P. Bulicke, D. Fuchs, G. Ulm, Applied Optics 37(25), pp. 6002-6005 (1998) [article]
Polarization of the 61st harmonic form 1053 nm laser radiation in neon
D. Schulze, M. Dörr, G. Sommerer, J. Ludwig, P. V. Nickles, T. Schlegel, W. Sandner, M. Drescher, U. Kleineberg, U. Heinzmann, Physical Review A 57(4), pp. 3003-3007 (1998) [article]
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Publications in 1997
Characterization of the helical undulator HELIOS I in the 520 to 930 eV range using a multilayer polarimeter
M. Drescher, G. Snell, U. Kleineberg, H.-J. Stock, N. Müller, U. Heinzmann, N. B. Brookes, Review of Scientific Instruments 68(5), pp. 1939-1944 (1997) [article]
Multilayer-coated soft x-ray diffraction gratings for synchrotron radiation applications
U. Kleineberg, H.-J. Stock, D. Menke, O. Wehmeyer, U. Heinzmann, D. Fuchs, P. Bulicke, M. Wedowski, G. Ulm, K. F. Heidemann, K. Osterried, Proceedings SPIE 3150, pp. 18-30 (1997) [article]
Multilayer-coated laminar grating with 16% normal-incidence efficiency in the 150-A wavelength region
J. F. Seely, M. P. Kowalski, R.G. Cruddace, K. F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, J. C. Rife, W.R. Hunter, Applied Optics 36(31), pp. 8206-8213 (1997) [article]
Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5-16.0-nm wavelength region
M. P. Kowalski, R. G. Cruddace, J. F. Seely, J. C. Rife, K. F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, W. R. Hunter, Optics Letters 22 (11), pp. 834-836 (1997) [article]
Carbon buffer layer for smoothing superpolished glass surfaces as substrates for molybdenum /silicon multilayer soft x-ray mirrors
H.-J. Stock, F. Hamelmann, U. Kleineberg, D. Menke, B. Schmiedeskamp, K. Osterried, K. F. Heidemann, U. Heinzmann, Appl. Optics 36(7), pp. 1650-1652 (1997) [article]
Thermal stability of W1-xSix/Si multilayer under rapid thermal annealing
R. Senderak, M. Jergel, S. Luby, E. Majkova, V. Holy, G. Haindl, F. Hamelmann, U. Kleineberg, U. Heinzmann, J. Appl. Phys. 81 (5) (1997) [article]
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Publications in 1996
Multilayer reflectors for polarization analysis of XUV radiation
D. Schulze, G. Sommerer, M. Drescher, J. Ludwig, U. Kleineberg, P. V. Nickles, U. Heinzmann, W. Sandner, X-Ray Lasers 1996, Int. Phys. Conf. Ser. No. 151, section 10 Eds. S. Svanders, C.-G. Walström, IOP publishing LTD, 1996: 353-357 [article]
Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses
E. D'Anna, A. Luches, M. Martino, M. Brunel, E. Majkova, S. Luby, R. Senderak, M. Jergel, F. Hamelmann, U. Kleineberg, U. Heinzmann, Appl. Surf. Sci. 106, pp. 166-170 (1996) [article]
Mo/Si Multilayer Coated Laminar Phase and Ruled Blaze Gratings for the Soft X-Ray Region
U. Kleineberg, H.-J. Stock, A. Kloidt, K. Osterried, D. Menke, B. Schmiedeskamp, U. Heinzmann, D. Fuchs, P. Müller, F. Scholze, G. Ulm, K. F. Heidemann, B. Nelles, J. Electr. Spectr. Rel. Phenom. 80, pp. 389-392 (1996) [article]
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Publications in 1995
Mo/Si-multilayer-coated ruled blazed gratings for the soft x-ray region
U. Kleineberg, K. Osterried, H.-J. Stock, D. Menke, B. Schmiedeskamp, D. Fuchs, P. Müller, F. Scholze, K. F. Heidemann, B. Nelles, U. Heinzmann, Appl. Optics 34 (28), pp. 6506-6512 (1995) [article]
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Publications in 1994
Characterization of GaAs/AlAs Interfaces with Silicon Interlayers
B. Schmiedeskamp, T. Tappe, B. Heidemann, J. Schlosser, G. Haindl, U. Kleineberg, T. Albers, M. Neumann, World Scientific (Singapore 1994)
Multilayer Reflection Type Zone Plates and Blazed Gratings for the Normal Incidence Soft X-Ray Region
U. Kleineberg, H.-J. Stock, D. Menke, K. Osterried, B. Schmiedeskamp, U. Heinzmann, D. Fuchs, P. Müller, F. Scholze, K. F. Heidemann, B. Nelles, J. Thieme, Proceedings SPIE 2279, pp. 269-282 (1994) [article]
Interface Stability and Silicide Formation in High Temperature Stable MoxSi1-x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and HRTEM
U. Kleineberg, H.-J. Stock, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, S. Hopfe, R. Scholz, physica status solidi (a) 145(2), pp. 539-550 (1994) [article]
Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
B. Schmiedeskamp, A. Kloidt, H.-J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, S. Rahn, K. Hilgers, B. Heidemann, T. Tappe, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze, K. F. Heidemann, Optical Engineering 33 (4), pp. 1314-1321 (1994) [article]
Thermal Stability of Mo/Si Multilayer Soft X-Ray Mirrors Fabricated by Electron-Beam Evaporation
H.-J. Stock, U. Kleineberg, B. Heidemann, K. Hilgers, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze, Appl. Phys. A 58(4), pp. 371-376 (1994) [article]
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Publications in 1993
Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment
A. Kloidt, H.-J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, B. Schmiedeskamp, U. Heinzmann, Thin Solid Films 228, pp. 154-157 (1993) [article]
Preparation and microstructure analysis of Mo/Si multilayers as x-ray optical components
A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, S. Rahn, K. Hilgers, B. Heidemann, T. Tappe, B. Schmiedeskamp, U. Heinzmann, Proceedings of Symposium on Surface Science, pp. 115-120, Kaprun/Austria May 9-15, (1993) [article]
Mo0.5Si0.5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity
H.-J. Stock, U. Kleineberg, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze, Appl. Phys. Lett. 63 (16), pp. 2207-2209 (1993) [article]
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Publications in 1992
Fabrication, thermal stability and reflectivity measurements of Mo/Si-multilayers as X-ray mirrors and other optical components
A. Kloidt, H.-J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, K. Nolting, B. Heidemann, T. Tappe, B. Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze, S. Rahn, J. Hormes, K. F. Heidemann, Proceedings SPIE 1742, pp. 593-603 (1992) [article]
Large area soft X-ray projection lithography using multilayer mirrors structured by RIE
S. Rahn, A. Kloidt, U. Kleineberg, B. Schmiedeskamp, K. Kadel, W. K. Schomburg, J. Hormes, U. Heinzmann, Proceedings SPIE 1742, pp. 585-592 (1992) [article]
Multischichten für optische Komponenten im weichen Röntgengebiet
B. Schmiedeskamp, T. Döhring, B. Heidemann, U. Kleineberg, A. Kloidt, K. Nolting, M. Pröpper, H.-J. Stock, T. Tappe und U. Heinzmann, VDI Verlag Dünnschichttechnologie '92, pp. 329-336 [article]
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Publications in 1991
Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment
A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann,P. Müller, M. Kühne, Appl. Phys. Lett. 58 (23), pp. 2601-2603 (1991) [article]
Fabrication and characterization of Si-based soft x-ray mirrors
B. Schmiedeskamp, B. Heidemann, U. Kleineberg, A. Kloidt, M. Kühne, P. Müller, K. Nolting and U. Heinzmann, Proceedings SPIE 1343, pp. 64-72 (1991) [article]
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Publications in 1990
Multischichten für optische Komponenten im weichen Röntgengebiet
B. Schmiedeskamp, T. Döhring, B. Heidemann, U. Kleineberg, A. Kloidt, H. Müller, K. Nolting und U. Heinzmann, VDI Verlag Dünnschichttechnologie '90 Bd. II, pp. 480-502 [article]
Spin-polarized LEED from Xe-Pt(111)
G. Hilgers, U. Kleineberg, K. Nolting, S. Wirth, N. Müller, U. Heinzmann, Vacuum 41 (1-3), 325-327 (1990) [article]